Measurement of optical constants for UV coating based on multilayer film model by spectroscopic ellipsometry

Huili Wu, Yi Tang*, Tingzhu Bai, Yurong Jiang, Jing Jiang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A reliable and accurate method based on multilayer film model by spectroscopic ellipsometry is proposed to measure optical constants of UV weak absorption films. Take examples of HfO2 film and SiO2 film, rnulti-angle ellipsometry parameters Psi and Delta had been measured by spectroscopic ellipsometry to inverse optical constants of HfO2 and SiO2 film between 200 nrn and 900 nin in Wavelength, which were fitted by point-by-point method using the Cauchy with urbach absorption model. Comparing the fitting result of ellipsometry and the test result of scanning electron microscopy (SEM), we verified the accuracy of the optical constants of HfO2 and SiO2 film. The results show that the structure and optical constants of weak absorption coating can be better described by Cauchy with urbach absorption model using point-by-point method, and the results are important for the fabrication of UV filters.

Original languageEnglish
Pages (from-to)89-94
Number of pages6
JournalGuangdian Gongcheng/Opto-Electronic Engineering
Volume42
Issue number9
DOIs
Publication statusPublished - 1 Sept 2015

Keywords

  • Film optics
  • Optical constants
  • Spectroscopic ellipsometry
  • Weak absorption coatings

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