Abstract
Interface chemistry of H2O on GaAs nanowires is investigated by in situ X-ray photoelectron spectroscopy (XPS) at elevated water vapor pressures (from UHV to 5 mbar) and temperatures (from room temperature to 400 °C). Surface-assisted water dissociation leads to oxidation and hydroxylation of surface Ga atoms. In comparison with the simple planar GaAs(1 0 0) crystal, the H2O dissociation process on GaAs nanowires is greatly enhanced at elevated pressures and temperatures.
Original language | English |
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Pages (from-to) | 51-55 |
Number of pages | 5 |
Journal | Chemical Physics Letters |
Volume | 605-606 |
DOIs | |
Publication status | Published - 17 Jun 2014 |
Externally published | Yes |
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Zhang, X., Lamere, E., Liu, X., Furdyna, J. K., & Ptasinska, S. (2014). Interface chemistry of H2O on GaAs nanowires probed by near ambient pressure X-ray photoelectron spectroscopy. Chemical Physics Letters, 605-606, 51-55. https://doi.org/10.1016/j.cplett.2014.05.007