Interface chemistry of H2O on GaAs nanowires probed by near ambient pressure X-ray photoelectron spectroscopy

Xueqiang Zhang, Edward Lamere, Xinyu Liu, Jacek K. Furdyna, Sylwia Ptasinska*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Interface chemistry of H2O on GaAs nanowires is investigated by in situ X-ray photoelectron spectroscopy (XPS) at elevated water vapor pressures (from UHV to 5 mbar) and temperatures (from room temperature to 400 °C). Surface-assisted water dissociation leads to oxidation and hydroxylation of surface Ga atoms. In comparison with the simple planar GaAs(1 0 0) crystal, the H2O dissociation process on GaAs nanowires is greatly enhanced at elevated pressures and temperatures.

Original languageEnglish
Pages (from-to)51-55
Number of pages5
JournalChemical Physics Letters
Volume605-606
DOIs
Publication statusPublished - 17 Jun 2014
Externally publishedYes

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Zhang, X., Lamere, E., Liu, X., Furdyna, J. K., & Ptasinska, S. (2014). Interface chemistry of H2O on GaAs nanowires probed by near ambient pressure X-ray photoelectron spectroscopy. Chemical Physics Letters, 605-606, 51-55. https://doi.org/10.1016/j.cplett.2014.05.007