Impurity-induced formation of bilayered graphene on copper by chemical vapor deposition

Jun Li, Jianing Zhuang, Chengmin Shen*, Yuan Tian, Yande Que, Ruisong Ma, Jinbo Pan, Yanfang Zhang, Yeliang Wang, Shixuan Du, Feng Ding, Hong Jun Gao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Citations (Scopus)

Abstract

High-quality single-layered and bilayered graphene (SLG and BLG) was synthesized on copper foil surfaces by controllable chemical vapor deposition (CVD). Impurity nanoparticles formed on the copper foil surface by hightemperature annealing were found to play a crucial role in the growth of BLG. Analysis of energy-dispersive spectrometry (EDS) data indicated that these nanoparticles consisted of silicon and aluminum. According to the inverted wedding cake model, these nanoparticles served as nucleation centers for BLG growth and the free space between a nanoparticle and graphene served as the center of C injection for the continuous growth of the adlayer beneath the top layer. By combining phase-field theory simulations, we confirmed the mechanism of BLG growth and revealed more details about it in comparison with SLG growth. For the first time, this study led to a complete understanding of the BLG growth mechanism from nucleation to continuous growth in the CVD process, and it has opened a door to the thickness-controllable synthesis of graphene. [Figure not available: see fulltext.]

Original languageEnglish
Pages (from-to)2803-2810
Number of pages8
JournalNano Research
Volume9
Issue number9
DOIs
Publication statusPublished - 1 Sept 2016
Externally publishedYes

Keywords

  • bilayer
  • chemical vapor deposition (CVD)
  • graphene
  • growth mechanism

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