HfSe2 monolayer stability tuning by strain and charge doping

Shujing Li, Mei Zhou, Xiaohui Wang, Fawei Zheng*, Xiaohong Shao, Ping Zhang

*Corresponding author for this work

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Abstract

Strain and charge doping are the effective ways to modulate the electronic and phonon properties of materials. The effects of biaxial tensile strains and charge dopings on the stabilities of HfSe2 monolayer have been systematically investigated using first-principles methods. Its two-dimensional Young's modulus is only 65.4 N/m, and it is easy to be stretched. When the tensile strain is applied on HfSe2 monolayer, two of its phonon modes soften with one frequency decreasing to zero at critical strain. Our results show that electron and hole dopings could suppress the softening of phonon modes, and significantly enhance the ideal strength by 28% and 36%, respectively. The calculations for electronic structures and phonon dispersions provide the theoretical references for future nano-device designing.

Original languageEnglish
Article number126534
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Volume384
Issue number23
DOIs
Publication statusPublished - 17 Aug 2020
Externally publishedYes

Keywords

  • Charge doping
  • Density functional theory
  • Phonon dispersions
  • Stability
  • Strain

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Li, S., Zhou, M., Wang, X., Zheng, F., Shao, X., & Zhang, P. (2020). HfSe2 monolayer stability tuning by strain and charge doping. Physics Letters, Section A: General, Atomic and Solid State Physics, 384(23), Article 126534. https://doi.org/10.1016/j.physleta.2020.126534