Hafnium intercalation between epitaxial graphene and Ir(111) substrate

Linfei Li*, Yeliang Wang, Lei Meng, Rong Ting Wu, H. J. Gao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

23 Citations (Scopus)

Abstract

We report on the change of structural and electronic properties while depositing Hf atoms onto the graphene epitaxially grown on Ir(111) substrate. We find that the Hf atoms intercalate between the graphene and its iridium host. This intercalation induces a new interface superstructure, as confirmed by scanning tunneling microscopy and low energy electron diffraction. Raman spectra reveal that the Hf-intercalated graphene shows the prominent features of intrinsic graphene. Our study suggests that the Hf intercalation acts as a buffer layer between the graphene and the Ir(111) substrate, restoring the graphenes intrinsic electronic properties.

Original languageEnglish
Article number093106
JournalApplied Physics Letters
Volume102
Issue number9
DOIs
Publication statusPublished - 4 Mar 2013
Externally publishedYes

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