Abstract
Using molecular dynamics simulations, the formation and growth of stacking fault tetrahedra (SFT) are captured by vacancy cluster diffusion and aggregation mechanisms in Ni. The vacancy-tetrahedron acts as a nucleation point for SFT formation. Simulations show that perfect SFT can grow to the next size perfect SFT via a vacancy aggregation mechanism. The stopping and range of ions in matter (SRIM) calculations and transmission electron microscopy (TEM) observations reveal that SFT can form farther away from the initial cascade-event locations, indicating the operation of diffusion-based vacancy-aggregation mechanism.
Original language | English |
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Pages (from-to) | 137-141 |
Number of pages | 5 |
Journal | Scripta Materialia |
Volume | 114 |
DOIs | |
Publication status | Published - 15 Mar 2016 |
Externally published | Yes |
Keywords
- Diffusion
- Molecular dynamics
- Point defect
- Stacking fault tetrahedra