Fabrication of electrostatic safety copper azide film with in situ growing MOF

Shuang Wang, Li Yang*, Zhenzhan Yan, Jimin Han, Xiaoting Ren*, Wei Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Due to its extremely low electrostatic sensitivity, copper azide primary explosive is greatly limited in practical applications. In this study, a composite film with Cu-MOF in-situ growth on carbon nanofilm was prepared by electrospinning and solvothermal methods, and CNF@Cu–N3 film with electrostatic safety was obtained by carbonization and azide later. Its electrostatic sensitivity (E50) was greatly increased from 0.05 mJ of raw materials to 4.06 mJ, and still maintained a good detonation performance which could successfully detonate the CL-20 secondary explosive. This is mainly due to the synergistic effect of the carbon film and the MOF structure, which greatly improves the conductivity of the entire system and the uniform distribution of copper particles, providing a new preparation strategy for metal azide film that is suitable for the micro-initiator device.

Original languageEnglish
Pages (from-to)93-100
Number of pages8
JournalDefence Technology
Volume27
DOIs
Publication statusPublished - Sept 2023

Keywords

  • Carbon nanofilm
  • Copper azide (CA)
  • Electrospinning
  • Electrostatic sensitivity
  • Metal-organic framework

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