Abstract
The electrical stability of flexible indium tin oxide (ITO) films fabricated on stripe SiO 2 buffer layer-coated polyethylene terephthalate (PET) substrates by magnetron sputtering was investigated by the bending test. The ITO thin films with stripe SiO 2 buffer layer under bending have better electrical stability than those with flat SiO 2 buffer layer and without buffer layer. Especially in inward bending text, the ITO thin films with stripe SiO 2 buffer layer only have a slight resistance change when the bending radius r is not less than 8 mm, while the resistances of the films with flat SiO 2 buffer layer and without buffer layer increase significantly at r = 16 mm with decreasing bending radius. This improvement of electrical stability in bending test is due to the small mismatch factor α in ITO-SiO 2 , the enhanced interface adhesion and the balance of residual stress. These results indicate that the stripe SiO 2 buffer layer is suited to enhance the electrical stability of flexible ITO film under bending.
Original language | English |
---|---|
Pages (from-to) | 4807-4810 |
Number of pages | 4 |
Journal | Applied Surface Science |
Volume | 257 |
Issue number | 11 |
DOIs | |
Publication status | Published - 15 Mar 2011 |
Keywords
- Buffer layer
- Electrical properties
- Indium tin oxide (ITO)
- Magnetron sputtering