Direct Patterning of Colloidal Nanocrystals via Thermally Activated Ligand Chemistry

Fu Li, Changhao Chen, Shaoyong Lu, Xueguang Chen, Wangyu Liu, Kangkang Weng, Zhong Fu, Dan Liu, Lipeng Zhang, Hannikezi Abudukeremu, Linhan Lin, Yuanyuan Wang, Minlin Zhong*, Hao Zhang*, Jinghong Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Precise patterning with microscale lateral resolution and widely tunable heights is critical for integrating colloidal nanocrystals into advanced optoelectronic and photonic platforms. However, patterning nanocrystal layers with thickness above 100 nm remains challenging for both conventional and emerging direct photopatterning methods, due to limited light penetration depths, complex mechanical and chemical incompatibilities, and others. Here, we introduce a direct patterning method based on a thermal mechanism, namely, the thermally activated ligand chemistry (or TALC) of nanocrystals. The ligand cross-linking or decomposition reactions readily occur under local thermal stimuli triggered by near-infrared lasers, affording high-resolution and nondestructive patterning of various nanocrystals under mild conditions. Patterned quantum dots fully preserve their structural and photoluminescent quantum yields. The thermal nature allows for TALC to pattern over 10 μm thick nanocrystal layers in a single step, far beyond those achievable in other direct patterning techniques, and also supports the concept of 2.5D patterning. The thermal chemistry-mediated TALC creates more possibilities in integrating nanocrystal layers in uniform arrays or complex hierarchical formats for advanced capabilities in light emission, conversion, and modulation.

Original languageEnglish
Pages (from-to)13674-13683
Number of pages10
JournalACS Nano
Volume16
Issue number9
DOIs
Publication statusPublished - 27 Sept 2022
Externally publishedYes

Keywords

  • colloidal nanocrystals
  • ligand thermal chemistry
  • optoelectronics
  • surface ligands
  • thermal patterning

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