Correction of remounting errors by masking reference points in small footprint polishing process

Tan Wang, Haobo Cheng*, Yong Chen, Yunpeng Feng, Zhichao Dong, Honyuen Tam

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The remounting accuracy of optical components between measurement and polishing affects the polishing results, especially for small polishing footprint processes such as magnetorheological jet polishing (MJP). In this paper, two important remounting errors (translation and rotation errors) are discussed, and a masking method is proposed to correct these errors. A mathematical model that describes the relationship between remounting errors and reference points is constructed. A mask is created to provide reference points on a sample because such points are important for identifying remounting errors. The remounting errors are then used as bases in correcting the parameters used for actual polishing. Experiments are conducted on a K9 optical sample to validate the proposed approach. After the reference points are obtained by measuring the mask on the sample, the remounting errors are derived. The translation errors are 5.61mmin the X direction and 6.08mmin the Y direction; the rotation error is 4.1o. Deviations from the desired positions are eliminated and the desired surface smoothness is obtained after parameter correction. Results indicate that the proposed method is suitable for high-precision polishing.

Original languageEnglish
Pages (from-to)7851-7858
Number of pages8
JournalApplied Optics
Volume52
Issue number33
DOIs
Publication statusPublished - 20 Nov 2013

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