TY - JOUR
T1 - Computational Study of Low-Energy Pt-Ion Implantation into Graphene for Single-Atom Catalysis
AU - Wang, Hao
AU - Tian, Jiting
AU - Guo, Linxin
AU - Guo, Xun
AU - Yan, Zhanfeng
AU - Zheng, Jian
AU - Feng, Qijie
AU - Zhou, Wei
AU - Xue, Jianming
N1 - Publisher Copyright:
© 2022 American Chemical Society. All rights reserved.
PY - 2022/6/24
Y1 - 2022/6/24
N2 - Single-atom catalysts (SACs) represent the ultimate goal of nanocatalysis fields. However, complex synthesis processes and pyrolysis inactivation problems are the two main challenges that plague the development of SACs. In this work, we propose that the ultralow-energy ion-implantation (ULEII) method could be utilized to simply and efficiently synthesize stable SACs. Our simulation results of Pt-ion implantation into graphene indicate that the total doping efficiency, including direct displacement doping and indirect trap doping, can be effectively optimized by delicately adjusting the energy of incident ions. Further systematic molecular dynamics simulations and first-principles calculations demonstrate that irradiation-induced vacancy defects can effectively capture and anchor adsorbed metal atoms on the graphene surface. The stability and migration characteristics of various defects are also clearly elucidated. Theoretically, by selecting an optimal ion energy, the ULEII method can achieve a doping efficiency as high as 73.4%.
AB - Single-atom catalysts (SACs) represent the ultimate goal of nanocatalysis fields. However, complex synthesis processes and pyrolysis inactivation problems are the two main challenges that plague the development of SACs. In this work, we propose that the ultralow-energy ion-implantation (ULEII) method could be utilized to simply and efficiently synthesize stable SACs. Our simulation results of Pt-ion implantation into graphene indicate that the total doping efficiency, including direct displacement doping and indirect trap doping, can be effectively optimized by delicately adjusting the energy of incident ions. Further systematic molecular dynamics simulations and first-principles calculations demonstrate that irradiation-induced vacancy defects can effectively capture and anchor adsorbed metal atoms on the graphene surface. The stability and migration characteristics of various defects are also clearly elucidated. Theoretically, by selecting an optimal ion energy, the ULEII method can achieve a doping efficiency as high as 73.4%.
KW - direct displacement doping
KW - first-principles calculations
KW - indirect trap doping
KW - ion implantation
KW - molecular dynamics simulation
UR - http://www.scopus.com/inward/record.url?scp=85131864806&partnerID=8YFLogxK
U2 - 10.1021/acsanm.2c02051
DO - 10.1021/acsanm.2c02051
M3 - Article
AN - SCOPUS:85131864806
SN - 2574-0970
VL - 5
SP - 8583
EP - 8593
JO - ACS Applied Nano Materials
JF - ACS Applied Nano Materials
IS - 6
ER -