Coarse-grained molecular dynamics simulations of particle behaviors in magnetorheological polishing fluid

Jinhuan Xu, Jianyong Li, Pengzhe Zhu*, Baozhen Li, Chaoyue Zhao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

Material removal in magnetorheological polishing (MRP) process is primarily caused by abrasive particles. To analyze the particle behaviors in MRP fluids, a biphasic coarse-grained molecular dynamics model including magnetic dipoles and abrasive particles is built. The effects of magnetic field gradient, magnetic strength and abrasive particle concentration are studied both from theoretical analysis and numerical simulation. The results show that the increased magnetic field gradient and intensity increase the probability that abrasive particles contact the workpiece significantly, while increased abrasive particle concentration reduces the probability. Moreover, increased magnetic field gradient and abrasive particle concentration greatly increase the response time of MRP fluid system undesirably, but the increased magnetic field intensity leads to a firstly increased but then dropped response time.

Original languageEnglish
Pages (from-to)68-81
Number of pages14
JournalComputational Materials Science
Volume163
DOIs
Publication statusPublished - 1 Jun 2019
Externally publishedYes

Keywords

  • Abrasive particle
  • Mesoscopic
  • Molecular dynamics simulation
  • Polishing

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