Axial profiles of argon helicon plasma by optical emission spectroscope and Langmuir probe

Huihui Wang, Zun Zhang, Kaiyi Yang, Chang Tan*, Ruilin Cui, Jiting Ouyang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

We present the axial profiles of argon helicon plasma measured by a local optical emission spectroscope (OES) and Langmuir RF-compensated probe. The results show that the emission intensity of the argon atom lines (750 nm, 811 nm) is proportional to the plasma density determined by the Langmuir probe. The axial profile of helicon plasma depends on the discharge mode which changes with the RF power. Excited by helical antenna, the axial distribution of plasma density is similar to that of the external magnetic field in the capacitive coupled mode (E-mode). As the discharge mode changes into the inductively coupled mode (H-mode), the axial distribution of plasma density in the downstream can still be similar to that of the external magnetic field, but becomes more uniform in the upstream. When the discharge entered wave coupled mode (W-mode), the plasma becomes nearly uniform along the axis, showing a completely different profile from the magnetic field. The W-mode is expected to be a mixed pattern of helicon (H) and Trivelpiece-Gould (TG) waves.

Original languageEnglish
Article number074009
JournalPlasma Science and Technology
Volume21
Issue number7
DOIs
Publication statusPublished - 20 May 2019

Keywords

  • Langmuir RF-compensated probe
  • axial profile
  • helicon plasma
  • local OES
  • mode transition

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