Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

Dengxin Ji; Borui Chen; Xie Zeng; Tania Moein; Haomin Song; Nan Zhang; Qiaoqiang Gan; Alexander Cartwright

doi:10.1364/fio.2015.fth3f.3

Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Nan Zhang, Qiaoqiang Gan, Alexander Cartwright

University at Buffalo

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

Original language	English
Title of host publication	Proceedings of Frontiers in Optics 2015, FIO 2015
Publisher	OSA - The Optical Society
ISBN (Electronic)	9781943580033
DOIs	https://doi.org/10.1364/fio.2015.fth3f.3
Publication status	Published - 2015
Externally published	Yes
Event	Frontiers in Optics 2015, FIO 2015 - San Jose, United States Duration: 18 Oct 2015 → 22 Oct 2015

Publication series

Name	Proceedings of Frontiers in Optics 2015, FIO 2015

Conference

Conference	Frontiers in Optics 2015, FIO 2015
Country/Territory	United States
City	San Jose
Period	18/10/15 → 22/10/15

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10.1364/fio.2015.fth3f.3

Cite this

Ji, D., Chen, B., Zeng, X., Moein, T., Song, H., Zhang, N., Gan, Q., & Cartwright, A. (2015). Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface. In Proceedings of Frontiers in Optics 2015, FIO 2015 (Proceedings of Frontiers in Optics 2015, FIO 2015). OSA - The Optical Society. https://doi.org/10.1364/fio.2015.fth3f.3

@inproceedings{907bacf2026f4ab3bdaf19e5538767eb,

title = "Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface",

abstract = "We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.",

author = "Dengxin Ji and Borui Chen and Xie Zeng and Tania Moein and Haomin Song and Nan Zhang and Qiaoqiang Gan and Alexander Cartwright",

note = "Publisher Copyright: {\textcopyright} 2015 Optical Society of America.; Frontiers in Optics 2015, FIO 2015 ; Conference date: 18-10-2015 Through 22-10-2015",

year = "2015",

doi = "10.1364/fio.2015.fth3f.3",

language = "English",

series = "Proceedings of Frontiers in Optics 2015, FIO 2015",

publisher = "OSA - The Optical Society",

booktitle = "Proceedings of Frontiers in Optics 2015, FIO 2015",

}

Ji, D, Chen, B, Zeng, X, Moein, T, Song, H, Zhang, N, Gan, Q & Cartwright, A 2015, Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface. in Proceedings of Frontiers in Optics 2015, FIO 2015. Proceedings of Frontiers in Optics 2015, FIO 2015, OSA - The Optical Society, Frontiers in Optics 2015, FIO 2015, San Jose, United States, 18/10/15. https://doi.org/10.1364/fio.2015.fth3f.3

TY - GEN

T1 - Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

AU - Ji, Dengxin

AU - Chen, Borui

AU - Zeng, Xie

AU - Moein, Tania

AU - Song, Haomin

AU - Zhang, Nan

AU - Gan, Qiaoqiang

AU - Cartwright, Alexander

PY - 2015

Y1 - 2015

N2 - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

AB - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

UR - http://www.scopus.com/inward/record.url?scp=85085850387&partnerID=8YFLogxK

U2 - 10.1364/fio.2015.fth3f.3

DO - 10.1364/fio.2015.fth3f.3

M3 - Conference contribution

AN - SCOPUS:85085850387

T3 - Proceedings of Frontiers in Optics 2015, FIO 2015

BT - Proceedings of Frontiers in Optics 2015, FIO 2015

PB - OSA - The Optical Society

T2 - Frontiers in Optics 2015, FIO 2015

Y2 - 18 October 2015 through 22 October 2015

ER -

Atomic-layer lithography of sub-10-nm plasmonic nanogaps on flat metallic surface

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