Annealing effects on the electrical and photoelectric performance of SnS 2 field-effect transistor

Hong Xu, Jie Xing*, Jing hao Lu, Xu Han, Danyang Li, Zhang Zhou, Li hong Bao, Hong jun Gao, Yuan Huang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

SnS 2 field effect transistor (FET) has been fabricated based on an exfoliated SnS 2 flake. The effect of vacuum and sulfur-vapor annealing on the electric and optoelectronic properties of SnS 2 FET have been investigated in detail. The experimental results indicate post-annealing, especially the sulfur-vapor annealing, has a strong impact on the electrical and photoelectric properties of SnS 2 FET. The decreasing of source-drain current with annealing, the shift of threshold voltage and the exponential function of photocurrent varying with light intensity all exhibit a close relevance with surface states in SnS 2 . The intriguing characteristics can be well explained by sulfur-vacancies-related trapping mechanism. These results not only advance the current understanding of the generation, trapping and recombination behavior of photoexcited carriers in two-dimensional materials, but also stimulate the potential applications in optoelectronic devices based on SnS 2 .

Original languageEnglish
Pages (from-to)39-44
Number of pages6
JournalApplied Surface Science
Volume484
DOIs
Publication statusPublished - 1 Aug 2019
Externally publishedYes

Keywords

  • 2D material
  • Field effect transistor
  • Optoelectronics
  • SnS
  • Sulfur vacancy

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