Analyzing in-plane magnetic anisotropy from surface morphology for amorphous films

B. Fan, F. Zeng*, X. W. Li, F. Lv, F. Pan, X. Y. Li, Y. Cao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

A method is developed to analyze the in-plane magnetic anisotropy from surface morphology for amorphous films. The lateral sizes along radial direction (R RD ) and tangent direction (R TD ) of rotational substrate, which are extracted from the surface morphology of Co 66.3 Zr 33.7 amorphous films, are used to calculate stress anisotropy energy E σ . It is found that E σ is consistent with the magnetic anisotropy energy K μ for the samples deposited on Si (1 0 0) substrate and then a relationship K μ ∝ 1/R RD - 1/R TD can be obtained. This method is sensitive to the initial state of substrate so its application range is discussed.

Original languageEnglish
Pages (from-to)6928-6931
Number of pages4
JournalApplied Surface Science
Volume254
Issue number21
DOIs
Publication statusPublished - 30 Aug 2008
Externally publishedYes

Keywords

  • Amorphous films
  • Magnetic anisotropy
  • Surface morphology
  • Surface stress

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