An analytical model for capacitance of silicon-insulator-silicon through-silicon-vias

Bohao Li, An'An Li, Miao Xiong, Jianxun Yang, Zhiming Chen, Yingtao Ding

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In order to achieve a minimum and stable TSV capacitance independent of operating voltage and frequency, a simple but feasible silicon-insulator-silicon (SIS) TSV structure is proposed using ultra-low-resistivity silicon (ULRS) and polymer Benzocyclobutene (BCB). In this paper, an analytical model for capacitance evaluation of the proposed SIS TSV is strictly derived in detail from Poisson's equation and physics of semiconductor. The analytical model shows a good agreement with both 3D full-wave electromagnetic simulation and on-wafer measurement within a wide frequency range up to 50 GHz. Constant C-and C-V characteristics as well as wafer-level uniformity and geometric verification are also demonstrated.

Original languageEnglish
Title of host publication2016 17th International Conference on Electronic Packaging Technology, ICEPT 2016
EditorsKeyun Bi, Sheng Liu, Shengjun Zhou
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1464-1468
Number of pages5
ISBN (Electronic)9781509013968
DOIs
Publication statusPublished - 4 Oct 2016
Event17th International Conference on Electronic Packaging Technology, ICEPT 2016 - Wuhan, China
Duration: 16 Aug 201619 Aug 2016

Publication series

Name2016 17th International Conference on Electronic Packaging Technology, ICEPT 2016

Conference

Conference17th International Conference on Electronic Packaging Technology, ICEPT 2016
Country/TerritoryChina
CityWuhan
Period16/08/1619/08/16

Keywords

  • capacitance
  • modeling
  • silicon-insulator-silicon (SIS)
  • through-silicon-via (TSV)

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