Al-Doping-Induced VO2 (B) Phase in VO2 (M) Toward Smart Optical Thin Films with Modulated ΔTvis and ΔTc

Shuxia Wang, Wei Wei, Tiantian Huang, Menghui Yuan, Yan Yang, Wanli Yang, Rui Zhang, Tianning Zhang, Zhimin Chen, Xin Chen*, Guozhen Shen, Ning Dai

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

Vanadium dioxide (VO2) thin films are among the promising candidates for smart optical materials and energy-saving devices with a metal–insulator transition (MIT) near room temperature. The modulation of hysteresis width (ΔTc) and optical characteristics of the solar spectral band (Tsol) during the MIT of vanadium oxides used for thermochromic devices is still challenging. In this article, we describe Al-doped VO2 thin films with modulated visible spectral band (Tvis) and ΔTc. The control of the Al/V ratio and Al-doping-induced VO2 (B) phases in VO2 is achieved by combining atomic layer deposition and post-annealing processes. With increasing Al/V ratio, the content of VO2 (B) phases increases in VO2 (M). ΔTvis, ΔTc, and Al-doping-induced VO2 (B) phases are found to be dependent on the aluminum content in thin films. ΔTvis up to 21.18% and ΔTc down to 3.3 K for Al-doped VO2 may be attributed to the coordinated interaction of both Al doping and the VO2 (B) phases in the VO2 matrix during MIT. These modulations may allow an understanding of the essential physics behind the MIT of doped VO2 and thus fabrication of smart optical sensors, energy-saving devices, and even ultrafast Mott transistors.

Original languageEnglish
Article number1900947
JournalAdvanced Engineering Materials
Volume21
Issue number12
DOIs
Publication statusPublished - 1 Dec 2019
Externally publishedYes

Keywords

  • atomic layer deposition
  • doping
  • metal–insulator transition
  • thin films
  • vanadium dioxide

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