Abstract
This paper reports a 1 mm2, two-axis, single-crystalline-silicon (SCS)-based aluminum-coated micromirror with large scanning angle (up to 40°), which can be used for biomedical imaging. The micromirror is fabricated by a deep-reactive-ion-etch post-CMOS micromachining process.
Original language | English |
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Title of host publication | 2003 IEEE/LEOS International Conference on Optical MEMS |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 14-15 |
Number of pages | 2 |
ISBN (Electronic) | 078037830X, 9780780378308 |
DOIs | |
Publication status | Published - 2003 |
Externally published | Yes |
Event | 2003 IEEE/LEOS International Conference on Optical MEMS - Waikoloa, United States Duration: 18 Aug 2003 → 21 Aug 2003 |
Publication series
Name | 2003 IEEE/LEOS International Conference on Optical MEMS |
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Conference
Conference | 2003 IEEE/LEOS International Conference on Optical MEMS |
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Country/Territory | United States |
City | Waikoloa |
Period | 18/08/03 → 21/08/03 |
Keywords
- Actuators
- Biomedical engineering
- Biomedical imaging
- Biomedical optical imaging
- Electrothermal effects
- Etching
- Micromirrors
- Microstructure
- Mirrors
- Substrates
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Jain, A., Xie, T., Pan, Y., Fedder, G. K., & Xie, H. (2003). A two-axis electrothermal SCS micromirror for biomedical imaging. In 2003 IEEE/LEOS International Conference on Optical MEMS (pp. 14-15). Article 1233444 (2003 IEEE/LEOS International Conference on Optical MEMS). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/OMEMS.2003.1233444