Abstract
This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.
Original language | English |
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Pages (from-to) | 861-863 |
Number of pages | 3 |
Journal | OSA Trends in Optics and Photonics Series |
Volume | 88 |
Publication status | Published - 2003 |
Externally published | Yes |
Event | Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States Duration: 1 Jun 2003 → 6 Jun 2003 |