TY - JOUR
T1 - A semi-empirical growth model study of W–C induced by focused ion beam with a Gaussian–Holtsmarkian distribution
AU - Dai, Jun
AU - Xie, Saipeng
AU - Chang, Hui
AU - Guo, Dengji
AU - Kometani, Reo
N1 - Publisher Copyright:
© 2017, Springer Science+Business Media, LLC.
PY - 2017/10/1
Y1 - 2017/10/1
N2 - Focused-ion-beam chemical vapour deposition (FIB-CVD) is a very useful direct fabrication technique for nano-structures. We focus on studying the growth model of FIB-CVD-based conducting W–C. An initial model is developed to simulate the distribution of secondary electrons generated from the collision process of ions crash into the solid. The experimental results show that the profile of the deposition has a minute but very long tail that can extend as far as 100 nm. Our model reveals that the Gaussian–Holtsmarkian distribution of the ion beam is responsible for the long tail of the profile. Additionally, the growth speed decreases as the deposition grows, since the occupancy of adsorbed gas molecules is reduced by the Joule heating effect. A semi-empirical model is finally established by revising the initial model with the experimental data. We believe the proposed model is very useful for exploring the growth mechanism and fabrication limit of FIB-CVD.
AB - Focused-ion-beam chemical vapour deposition (FIB-CVD) is a very useful direct fabrication technique for nano-structures. We focus on studying the growth model of FIB-CVD-based conducting W–C. An initial model is developed to simulate the distribution of secondary electrons generated from the collision process of ions crash into the solid. The experimental results show that the profile of the deposition has a minute but very long tail that can extend as far as 100 nm. Our model reveals that the Gaussian–Holtsmarkian distribution of the ion beam is responsible for the long tail of the profile. Additionally, the growth speed decreases as the deposition grows, since the occupancy of adsorbed gas molecules is reduced by the Joule heating effect. A semi-empirical model is finally established by revising the initial model with the experimental data. We believe the proposed model is very useful for exploring the growth mechanism and fabrication limit of FIB-CVD.
UR - http://www.scopus.com/inward/record.url?scp=85024496960&partnerID=8YFLogxK
U2 - 10.1007/s10853-017-1377-y
DO - 10.1007/s10853-017-1377-y
M3 - Article
AN - SCOPUS:85024496960
SN - 0022-2461
VL - 52
SP - 12326
EP - 12335
JO - Journal of Materials Science
JF - Journal of Materials Science
IS - 20
ER -