A process for fabricating robust electrothermal micromirrors with customizable thermal response time and power consumption

S. Pal*, H. Xie

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

A novel process for fabricating robust electrothermal bimorph based MEMS devices is reported and scanning electrothermal micromirrors are fabricated. Device parameters can be chosen to customize thermal response time and power requirements. Aluminum (Al) and Tungsten (W) form the active bimorph layers and polyimide is used for thermal isolation.

Original languageEnglish
Title of host publicationProceedings - OMN2011
Subtitle of host publication16th International Conference on Optical MEMS and Nanophotonics
Pages157-158
Number of pages2
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event16th International Conference on Optical MEMS and Nanophotonics, OMN2011 - Istanbul, Turkey
Duration: 8 Aug 201111 Aug 2011

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Conference

Conference16th International Conference on Optical MEMS and Nanophotonics, OMN2011
Country/TerritoryTurkey
CityIstanbul
Period8/08/1111/08/11

Keywords

  • MEMS
  • electrothermal
  • micromirror
  • robust

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