A Novel Method for Co-Rich Amorphous Alloy Wire Electrical Interconnection by Using PI Film as Solder Mask

Chuan Chen*, Yan Wang, Bo Zhang, Yadong Wan, Chao Zhang, Jianhua Li

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Co-rich amorphous alloy wire is an excellent material for magnetic sensor due to its extremely high giant magnetoresistance effect (GMI) performance. While, it shows poor wettability with solder, thus hard to control the welding area, which leads to large contact resistance variance when soldering with substrate or package due to the interconnection area can't be accurately controlled. To improve the wettability between amorphous alloy wire and solder and achieve small contact resistance variance, a novel electrical interconnection method is proposed. First, a photosensitive polyimide film (PSPI) is patterned by spin coating, exposure and developing to form vias at the two ends of the amorphous alloy wire. Next, a thin Cu/Ni composite layer with thickness 200nm/300nm were deposited sequentially on the surface of amorphous alloy wire. Then, solder paste is stencil printed into these vias and reflow to compete the electrical interconnection between the amorphous alloy wire and the substrate or package. Thick PSPI film is employed as solder mask due to its excellent properties, such as high temperature stability, thick film formation and easy to be patterned. The test results showed that there is one order magnitude reduction in standard deviation of the electrical resistance comparing to the results obtained by conventional welding process.

Original languageEnglish
Title of host publication2024 IEEE 19th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350359831
DOIs
Publication statusPublished - 2024
Externally publishedYes
Event19th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024 - Kyoto, Japan
Duration: 2 May 20245 May 2024

Publication series

Name2024 IEEE 19th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024

Conference

Conference19th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024
Country/TerritoryJapan
CityKyoto
Period2/05/245/05/24

Keywords

  • amorphous wire
  • contact resistance
  • GMI
  • magnetic sensor
  • solder

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