TY - GEN
T1 - A Novel Method for Co-Rich Amorphous Alloy Wire Electrical Interconnection by Using PI Film as Solder Mask
AU - Chen, Chuan
AU - Wang, Yan
AU - Zhang, Bo
AU - Wan, Yadong
AU - Zhang, Chao
AU - Li, Jianhua
N1 - Publisher Copyright:
© 2024 IEEE.
PY - 2024
Y1 - 2024
N2 - Co-rich amorphous alloy wire is an excellent material for magnetic sensor due to its extremely high giant magnetoresistance effect (GMI) performance. While, it shows poor wettability with solder, thus hard to control the welding area, which leads to large contact resistance variance when soldering with substrate or package due to the interconnection area can't be accurately controlled. To improve the wettability between amorphous alloy wire and solder and achieve small contact resistance variance, a novel electrical interconnection method is proposed. First, a photosensitive polyimide film (PSPI) is patterned by spin coating, exposure and developing to form vias at the two ends of the amorphous alloy wire. Next, a thin Cu/Ni composite layer with thickness 200nm/300nm were deposited sequentially on the surface of amorphous alloy wire. Then, solder paste is stencil printed into these vias and reflow to compete the electrical interconnection between the amorphous alloy wire and the substrate or package. Thick PSPI film is employed as solder mask due to its excellent properties, such as high temperature stability, thick film formation and easy to be patterned. The test results showed that there is one order magnitude reduction in standard deviation of the electrical resistance comparing to the results obtained by conventional welding process.
AB - Co-rich amorphous alloy wire is an excellent material for magnetic sensor due to its extremely high giant magnetoresistance effect (GMI) performance. While, it shows poor wettability with solder, thus hard to control the welding area, which leads to large contact resistance variance when soldering with substrate or package due to the interconnection area can't be accurately controlled. To improve the wettability between amorphous alloy wire and solder and achieve small contact resistance variance, a novel electrical interconnection method is proposed. First, a photosensitive polyimide film (PSPI) is patterned by spin coating, exposure and developing to form vias at the two ends of the amorphous alloy wire. Next, a thin Cu/Ni composite layer with thickness 200nm/300nm were deposited sequentially on the surface of amorphous alloy wire. Then, solder paste is stencil printed into these vias and reflow to compete the electrical interconnection between the amorphous alloy wire and the substrate or package. Thick PSPI film is employed as solder mask due to its excellent properties, such as high temperature stability, thick film formation and easy to be patterned. The test results showed that there is one order magnitude reduction in standard deviation of the electrical resistance comparing to the results obtained by conventional welding process.
KW - amorphous wire
KW - contact resistance
KW - GMI
KW - magnetic sensor
KW - solder
UR - http://www.scopus.com/inward/record.url?scp=85203840210&partnerID=8YFLogxK
U2 - 10.1109/NEMS60219.2024.10639851
DO - 10.1109/NEMS60219.2024.10639851
M3 - Conference contribution
AN - SCOPUS:85203840210
T3 - 2024 IEEE 19th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024
BT - 2024 IEEE 19th International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 19th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2024
Y2 - 2 May 2024 through 5 May 2024
ER -