A model study of the surface discharge induced plasma chemical process

Ouyang Jiting*, Feng Changgen, Hui Hexing

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

Here we present an equivalent circuit model for the study of the surface discharge induced plasma chemical process (SPCP). The simplified model consists of a series of gaseous and ceramic capacitors. The discharge characteristics of the SPCP device are investigated based on this model. The discharge current, the average length of the streamer filaments, the inception breakdown voltage, the density of the surface charges, the dynamic capacity and the effective energy associated with the discharge process are simulated. The computed results are in good agreement with the experimental data.

Original languageEnglish
Pages (from-to)1852-1856
Number of pages5
JournalJournal Physics D: Applied Physics
Volume31
Issue number15
DOIs
Publication statusPublished - 7 Aug 1998

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