Abstract
The gyroscope reported in this paper is a lateral-axis angular rate sensor with in-plane vibration and out-of-plane Coriolis acceleration sensing. The sensor plus on-chip CMOS circuitry is about 1 mm by 1 mm in size and is fabricated by a post-CMOS micromachining process that uses interconnect metal layers as etching mask(s) and a single-crystal silicon layer as the structural material. The resultant device incorporates both 1.8 μm-thick thin-film structures and 60 μm thick bulk Si structures to simultaneously achieve spring beams with either in-plane or out-of-plane compliance. The microstructure is flat and avoids the curling problem existing in thin-film CMOS gyroscopes. A unique silicon electrical isolation technique is used to obtain individually controllable comb fingers. The noise floor of the gyroscope is 0.02 °/s/Hz1/2 at 5 Hz.
Original language | English |
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Pages | 1413-1418 |
Number of pages | 6 |
Publication status | Published - 2002 |
Externally published | Yes |
Event | First IEEE International Conference on Sensors - IEEE Sensors 2002 - Orlando, FL, United States Duration: 12 Jun 2002 → 14 Jun 2002 |
Conference
Conference | First IEEE International Conference on Sensors - IEEE Sensors 2002 |
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Country/Territory | United States |
City | Orlando, FL |
Period | 12/06/02 → 14/06/02 |
Keywords
- CMOS-MEMS
- DRIE
- Electrical isolation
- Gyroscope