A controllable IC-compatible thin-film fuse realized using electro-explosion

Xuran Ding; Wenzhong Lou; Yue Feng

doi:10.1063/1.4941074

A controllable IC-compatible thin-film fuse realized using electro-explosion

Xuran Ding^*, Wenzhong Lou, Yue Feng

^*Corresponding author for this work

School of Mechatronical Engineering

Beijing Institute of Technology

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

A controllable IC-compatible thin-film fuse was developed that had Al/SiO₂ thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.

Original language	English
Article number	015316
Journal	AIP Advances
Volume	6
Issue number	1
DOIs	https://doi.org/10.1063/1.4941074
Publication status	Published - Jan 2016

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10.1063/1.4941074

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abstract = "A controllable IC-compatible thin-film fuse was developed that had Al/SiO2 thin-film stacks on a silicon substrate. The micro fuse has both a traditional mode and a controllable mode when applied as a fuse. It blows at 800 mA and 913.8 mV in the traditional mode. In the controllable mode, it blows within 400 ns at 10 V. It can be used for small electronic elements as well as electropyrotechnic initiators to improve the no-firing current.",

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A controllable IC-compatible thin-film fuse realized using electro-explosion

Abstract

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