低能离子注入植物种子深度的研究

Translated title of the contribution: Penetrating depth for ion with low energy implanted in plant seeds

Binrong Wang, Yanhua You, Xiaoli Yang, Haiyun Hu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

[Background] Low-energy ion implantation is a new biological mutation source possessing the characteristics of high mutation rate and light damage, which extends the ion beam bio-engineering. [Purpose] This paper aims to study the depth of ion implantation in seeds by making better use of ion beam for bio-engineering. [Methods] Considering the size of the void volume, a non-equilibrium statistical theory model was proposed for easy analysis of the penetrating process. The dynamic penetrating process was studied by combining the range theory model of the collision and the non-equilibrium statistical theory model of low-energy ion implanting into plant seeds. Probability density function of penetrating depth was deduced by solving the Fokker-Planck function which is equivalent to the general Langevin equation. [Results] The average penetrating depth of nitrogen ions at projectile energy of 30 keV in brown rice seeds was calculated, and the influence of the cavity inside the seeds on the penetrating depth of ions was analyzed by comparison.

Translated title of the contributionPenetrating depth for ion with low energy implanted in plant seeds
Original languageChinese (Traditional)
Article number030202
JournalHe Jishu/Nuclear Techniques
Volume41
Issue number3
DOIs
Publication statusPublished - 10 Mar 2018

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