Flatness and diffractive wavefront measurement of liquid crystal computer-generated hologram based on photoalignment technology

Yao Hu, Shihang Fu, Shaopu Wang, Wanlong Zhang, Hoi Sing Kwok

科研成果: 书/报告/会议事项章节会议稿件同行评审

2 引用 (Scopus)

摘要

Interferometry with computer-generated hologram (CGH) has been widely used in the field of precision optical testing and metrology. CGH can easily generate reference wavefronts of any desired shape by controlling the phase of the diffracted light. Traditional CGH is made by etching a specific pattern on a substrate, whose cost is extremely high and the phase of the diffraction wavefront is sensitive to the changes in etching depth. Based on photoalignment technology, liquid crystal (LC) can be fabricated into LC-CGH. The LC phase modulation elements made by this technology have the advantage of low cost and high accuracy. The existing phase modulation elements based on photoalignment technology are mostly qualitative phase controller, such as LC-grating and LC-wave plate. They are rarely used in high precision applications. In the field of optical testing, the high precision of diffractive wavefront of LC-CGH is critical. The wavefront changes due to phase retardation in adjacent areas of LC-CGH is affected by the flatness of the LC film. Therefore, it is essential to keep the surface of the LC-CGH flat. In this paper, we measure the surface flatness and the diffraction wavefront of the LC-CGH film to verify the feasibility of LC-CGH in optical testing. First, we introduce photoalignment technology and analyze the principle of LC-CGH. Second, we measure the surface flatness of LC-CGH. In the end, we evaluate the transmitted diffraction wavefront. The results can provide guidance for the LC-CGH process improvement.

源语言英语
主期刊名9th International Symposium on Advanced Optical Manufacturing and Testing Technologies
主期刊副标题Meta-Surface-Wave and Planar Optics
编辑Changtao Wang, Minghui Hong, Xiangang Luo, Xiong Li, Xiaoliang Ma, Mingbo Pu
出版商SPIE
ISBN(电子版)9781510623248
DOI
出版状态已出版 - 2019
活动9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Meta-Surface-Wave and Planar Optics - Chengdu, 中国
期限: 26 6月 201829 6月 2018

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
10841
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Meta-Surface-Wave and Planar Optics
国家/地区中国
Chengdu
时期26/06/1829/06/18

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