TUnnel magnetoresistance in the ferromagnetic tunnel junction with ferromagnetic layers of finite thickness subjected to an electric field

Xiang Dong Zhang*, Jun Zhong Wang, Bo Zang Li, Fu Cho Pu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Based on the two-band model, we investigate the tunnel magnetoresistance(TMR) in ferromagnet/insulator(semiconductor)/ferromagnet(FM/I(S)/FM) tunnel junction covered on both sides by nonmagnetic metal layers subjected to an electric field. Our results show that TMR oscillates with the thickness of ferromagnetic layers owing to the quantum-size effect and can reach very large value under suitable conditions, which may in general not be reached in FM/I(S)/FM with infinitely thick ferromagnetic layer. Although the electric field causes the change of the oscillation period, phase and amplitude of the TMR, a large TMR is still obtained in some situations with the electric field. Furthermore, the electric field does not change the feature that TMR varies monotonously with the change of magnetization angle of the middle ferromagnetic layer.

Original languageEnglish
Pages (from-to)703-710
Number of pages8
JournalChinese Physics
Volume7
Issue number9
Publication statusPublished - Sept 1998
Externally publishedYes

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