Transparent and conductive IZO films: Oxygen and discharge voltage controlled sputtering growth and properties

Pei lei*, Xiaoting Chen, Yue yan, Jingjing Peng, Changshan Hao, Jianchao Ji, Zhongqi Huo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Zinc-doped indium oxide (IZO) film, as an important transparent conductive oxide, has attracted increasing attention in various scientific and engineering areas. In the present work, discharge-voltage and reactive-oxygen controlled IZO films were grown by magnetron sputtering and studied systematically. The microstructure, element distribution and chemical bonding of IZO films were investigated by X-Ray diffraction (XRD), transmission electron microscope (TEM), Energy Dispersive X-Ray Spectroscopy (EDX) and X-ray photoelectron spectroscopy (XPS). The optical and electrical properties of IZO films were studied by controlled oxygen and discharge voltage. The typical microstructure of IZO films with optimal optical and electric properties has been characterized. High discharge voltage and matched oxygen vacancies could promote the low resistivity of IZO films, which could be determined by the electronic concentration and mobility.

Original languageEnglish
Article number110645
JournalVacuum
Volume195
DOIs
Publication statusPublished - Jan 2022
Externally publishedYes

Keywords

  • Electrical properties
  • IZO films
  • Magnetron sputtering
  • Optical properties

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