The use of AFM in assessing the crack resistance of silicon wafers of various orientations

Vasilina A. Lapitskaya, Tatyana A. Kuznetsova, Anastasiya V. Khabarava, Sergei A. Chizhik, Sergei M. Aizikovich, Evgeniy V. Sadyrin*, Boris I. Mitrin, Weifu Sun

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Crack resistance of silicon wafers plays a vital role in development of MEMS technologies containing beam elements. In the present research, this characteristic was determined using the Vickers tip indentation method. The critical stress intensity factor KIC and fracture energy GIC of silicon wafers of (1 0 0), (1 1 0), and (1 1 1) crystallographic orientations were evaluated. The measurements were supplemented by imaging of indents using atomic force microscopy (AFM). The correlation of these parameters with the specific surface energy, Young's modulus E and microhardness H was conducted. The values of E and H were evaluated by nanoindentation. The dependences of KIC and GIC on the load of silicon wafers of (1 0 0), (1 1 0), and (1 1 1) orientations were obtained.

Original languageEnglish
Article number107926
JournalEngineering Fracture Mechanics
Volume259
DOIs
Publication statusPublished - Jan 2022

Keywords

  • Atomic force microscopy
  • Crack
  • Fracture energy
  • Fracture toughness
  • Orientation
  • Silicon
  • Specific surface energy
  • Surface damage

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