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Smooth etching of epitaxially grown AlN film by Cl2/BCl3/Ar-based inductively coupled plasma
Xianwen Liu, Changzheng Sun*, Bing Xiong, Lang Niu, Zhibiao Hao, Yanjun Han, Yi Luo
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
37
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(Scopus)