Preparation of graphitic carbon nitride by electrodeposition

Chao Li, Chuanbao Cao*, Hesun Zhu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

The CNx thin film was deposited on Si(100) substrate from a saturated acetone solution of cyanuric trichloride and melamine (cyanuric trichloride/melamine=1: 1.5) at room temperature. X-ray diffraction (XRD) results showed that the diffraction peaks in the pattern coincided well with those of graphite-like carbon nitride calculated in the literature. The lattice constants (a=4.79 Å, c=6.90 Å) for g-C3N4 matched with those of ab initio calculations (a=4.74 Å, c=6.72 Å) quite well. X-ray photoelectron spectroscopy (XPS) measurements indicated that the elements in the deposited films were mostly of C and N (N/C=0.75), and N (400.00 eV) bonded with C (287.72 eV) in the form of six-member C 3N3 ring. The peaks at 800 cm-1, 1310 cm -1 and 1610 cm-1 in the Fourier transform infrared (FTIR) spectrum indicated that triazine ring existed in the product. These results demonstrated that crystalline g-C3N4 was obtained in the CNx film.

Original languageEnglish
Pages (from-to)1737-1740
Number of pages4
JournalChinese Science Bulletin
Volume48
Issue number16
DOIs
Publication statusPublished - 2003

Keywords

  • CN thin film
  • Electrodeposition
  • Graphitic carbon nitride
  • IR
  • XPS
  • XRD

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