Photosensitive ZrO 2 suspensions for stereolithography

Keqiang Zhang, Rujie He*, Chen Xie, Gang Wang, Guojiao Ding, Min Wang, Weidong Song, Daining Fang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

116 Citations (Scopus)

Abstract

In this work, high solid loading, low viscosity photosensitive ZrO 2 suspensions with optimized rheological properties for stereolithography based additive manufacturing was developed. The influence of dispersant types, concentrations and solid loading on their dispersion behavior and rheological behavior were studied. In addition, the dispersion mechanism and suspension stability were also characterized. The optimal dispersant and concentration for the suspension with 40 vol% solid loading were KO110 and 2 wt%, respectively. These results revealed that the ZrO 2 suspensions presented near-fluid behavior, which was close to Newtonian flow, resulting in a low viscosity and stability for stereolithography based additive manufacturing. A photosensitive ZrO 2 suspension with a high solid loading of 55 vol% and a low viscosity of 1.65 Pa s at the shear rate of 200 s −1 was achieved when the dispersant and concentration were KOS110 and 2 wt%, respectively.

Original languageEnglish
Pages (from-to)12189-12195
Number of pages7
JournalCeramics International
Volume45
Issue number9
DOIs
Publication statusPublished - 15 Jun 2019

Keywords

  • Dispersion
  • Rheological behavior
  • Solid loading
  • Stereolithography

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