Orthogonality measurement of cross-grating based on image processing of multi-order diffraction patterns

Yao Hu, Nanfen Wang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Cross-gratings or two-dimensional gratings have found applications in precision displacement measurement for nano-scale machine tools or mask-wafer alignment in photo-lithography. The orthogonality of displacement measurement or alignment in two perpendicular directions is assured by the orthogonality of the grating grooves. Once the grooves are not exactly normal to each other, it should be calibrated before measurement or alignment to guarantee the accuracy. Scanning probe microscopy (SPM) and optical diffractometry (OD) are commonly used for highly accurate calibration of cross-grating orthogonality. In this paper, two methods based on diffraction are proposed for middle accuracy measurement at relative higher speed. At first, we briefly explain the configuration of each method. The calibration results of cross-gratings are shown. We also discuss the results of uncertainty analysis and the cause of main uncertainty sources.

Original languageEnglish
Title of host publicationMeasurement Technology and Intelligent Instruments XI
PublisherTrans Tech Publications Ltd.
Pages64-69
Number of pages6
ISBN (Print)9783038351122
DOIs
Publication statusPublished - 2014
Event11th International Symposium on Measurement Technology and Intelligent Instruments, ISMTII 2013 - Aachen, Germany
Duration: 1 Jul 20133 Jul 2013

Publication series

NameKey Engineering Materials
Volume613
ISSN (Print)1013-9826
ISSN (Electronic)1662-9795

Conference

Conference11th International Symposium on Measurement Technology and Intelligent Instruments, ISMTII 2013
Country/TerritoryGermany
CityAachen
Period1/07/133/07/13

Keywords

  • Cross-grating
  • Diffraction pattern
  • Image processing
  • Orthogonality measurement

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