Impact of non-uniform polarized illumination on hyper-NA lithography

Xuejia Guo; Yanqiu Li

doi:10.1117/12.916307

Impact of non-uniform polarized illumination on hyper-NA lithography

Xuejia Guo, Yanqiu Li^*

^*Corresponding author for this work

School of Optics and Photonics

Beijing Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

Original language	English
Title of host publication	Optical Microlithography XXV
DOIs	https://doi.org/10.1117/12.916307
Publication status	Published - 2012
Event	Optical Microlithography XXV - San Jose, CA, United States Duration: 13 Feb 2012 → 16 Feb 2012

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8326
ISSN (Print)	0277-786X

Conference

Conference	Optical Microlithography XXV
Country/Territory	United States
City	San Jose, CA
Period	13/02/12 → 16/02/12

Keywords

Degree of polarization
Hyper-NA lithography
Polarized illumination

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10.1117/12.916307

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Guo, X., & Li, Y. (2012). Impact of non-uniform polarized illumination on hyper-NA lithography. In Optical Microlithography XXV Article 832623 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8326). https://doi.org/10.1117/12.916307

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title = "Impact of non-uniform polarized illumination on hyper-NA lithography",

abstract = "Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.",

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author = "Xuejia Guo and Yanqiu Li",

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language = "English",

isbn = "9780819489821",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

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T1 - Impact of non-uniform polarized illumination on hyper-NA lithography

AU - Guo, Xuejia

AU - Li, Yanqiu

PY - 2012

Y1 - 2012

N2 - Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

AB - Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

KW - Degree of polarization

KW - Hyper-NA lithography

KW - Polarized illumination

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M3 - Conference contribution

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T3 - Proceedings of SPIE - The International Society for Optical Engineering

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T2 - Optical Microlithography XXV

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ER -

Impact of non-uniform polarized illumination on hyper-NA lithography

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