Flexible Films of Covalent Organic Frameworks with Ultralow Dielectric Constants under High Humidity

Pengpeng Shao, Jie Li, Fan Chen, Li Ma, Qingbin Li, Mengxi Zhang, Junwen Zhou, Anxiang Yin, Xiao Feng*, Bo Wang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

125 Citations (Scopus)

Abstract

Covalent organic framework (COF) films combine the processability of polymers with the porosity and atomic precision of crystalline porous materials, properties that are long-sought-after in electronics yet hard to realize. Herein, we prepared four flexible COF films with different alkoxy side chains via interfacial polymerization. The COF films exhibit an ultralow dielectric constant (κ=1.19±0.04 at 105 Hz), small dielectric loss (<0.02, 103–106 Hz), high breakdown voltage (>63 kV cm−1) and low leakage current (10−10 A cm−2 at 1 kV cm−1). They have considerable mechanical strength, and ability to withstand high humidity (RH 70 % for 10 days) and repeated bending (1000 times) without losing their dielectric properties. Extension of the alkoxy chains reduces the film's κ and enhances its moisture resistance, while incorporation of guest molecules further increase the κ value up to 43 times.

Original languageEnglish
Pages (from-to)16501-16505
Number of pages5
JournalAngewandte Chemie - International Edition
Volume57
Issue number50
DOIs
Publication statusPublished - 10 Dec 2018

Keywords

  • COF films
  • covalent organic frameworks (COFs)
  • dielectric constants
  • flexible
  • moisture resistant

Fingerprint

Dive into the research topics of 'Flexible Films of Covalent Organic Frameworks with Ultralow Dielectric Constants under High Humidity'. Together they form a unique fingerprint.

Cite this