Original language | English |
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Pages (from-to) | 82-84 |
Number of pages | 3 |
Journal | Journal of the Optical Society of America A: Optics and Image Science, and Vision |
Volume | 27 |
Issue number | 1 |
DOIs |
|
Publication status | Published - 1 Jan 2010 |
Externally published | Yes |
Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))
Xu Ma*, Gonzalo R. Arce
*Corresponding author for this work
Research output: Contribution to journal › Comment/debate
3
Citations
(Scopus)