Erratum: Binary mask optimization for forward lithography based on boundary layer model in coherent systems (Journal of the Optical Society of America A: Optics and Image Science, and Vision (2009) 26 (1687-1692))

Xu Ma*, Gonzalo R. Arce

*Corresponding author for this work

Research output: Contribution to journalComment/debate

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)82-84
Number of pages3
JournalJournal of the Optical Society of America A: Optics and Image Science, and Vision
Volume27
Issue number1
DOIs
Publication statusPublished - 1 Jan 2010
Externally publishedYes

Cite this