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Effect of thickness and crystalline morphology on electrical properties of rf-magnetron sputtering deposited Bi4Ti3O12 thin films
Shuai Ma, Xingwang Cheng*, Zhaolong Ma, Tayyeb Ali, Zhijun Xu, Ruiqing Chu
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
6
Citations
(Scopus)