Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

Xinyi Zhang; Yuqing Chen; Yanbei Nan; Yanqiu Li

doi:10.1109/IWAPS60466.2023.10366157

Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

Xinyi Zhang, Yuqing Chen, Yanbei Nan, Yanqiu Li^*

^*Corresponding author for this work

School of Optics and Photonics

Beijing Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.

Original language	English
Title of host publication	IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions
Editors	Yayi Wei, Tianchun Ye
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9798350344547
DOIs	https://doi.org/10.1109/IWAPS60466.2023.10366157
Publication status	Published - 2023
Event	7th International Workshop on Advanced Patterning Solutions, IWAPS 2023 - Lishui, Zhejiang Province, China Duration: 26 Oct 2023 → 27 Oct 2023

Publication series

Name	IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions

Conference

Conference	7th International Workshop on Advanced Patterning Solutions, IWAPS 2023
Country/Territory	China
City	Lishui, Zhejiang Province
Period	26/10/23 → 27/10/23

Keywords

Extreme Ultraviolet Lithography
Illumination System Design
Large field of view

Access to Document

10.1109/IWAPS60466.2023.10366157

Cite this

Zhang, X., Chen, Y., Nan, Y., & Li, Y. (2023). Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System. In Y. Wei, & T. Ye (Eds.), IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions (IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IWAPS60466.2023.10366157

Zhang, Xinyi ; Chen, Yuqing ; Nan, Yanbei et al. / Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System. IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions. editor / Yayi Wei ; Tianchun Ye. Institute of Electrical and Electronics Engineers Inc., 2023. (IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions).

@inproceedings{974e3e87965b4cad92d56bcf662b5ba3,

title = "Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System",

abstract = "The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.",

keywords = "Extreme Ultraviolet Lithography, Illumination System Design, Large field of view",

author = "Xinyi Zhang and Yuqing Chen and Yanbei Nan and Yanqiu Li",

note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 7th International Workshop on Advanced Patterning Solutions, IWAPS 2023 ; Conference date: 26-10-2023 Through 27-10-2023",

year = "2023",

doi = "10.1109/IWAPS60466.2023.10366157",

language = "English",

series = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

editor = "Yayi Wei and Tianchun Ye",

booktitle = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",

address = "United States",

}

Zhang, X, Chen, Y, Nan, Y & Li, Y 2023, Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System. in Y Wei & T Ye (eds), IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions. IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions, Institute of Electrical and Electronics Engineers Inc., 7th International Workshop on Advanced Patterning Solutions, IWAPS 2023, Lishui, Zhejiang Province, China, 26/10/23. https://doi.org/10.1109/IWAPS60466.2023.10366157

Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System. / Zhang, Xinyi; Chen, Yuqing; Nan, Yanbei et al.
IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions. ed. / Yayi Wei; Tianchun Ye. Institute of Electrical and Electronics Engineers Inc., 2023. (IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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T1 - Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

AU - Zhang, Xinyi

AU - Chen, Yuqing

AU - Nan, Yanbei

AU - Li, Yanqiu

PY - 2023

Y1 - 2023

N2 - The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.

AB - The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.

KW - Extreme Ultraviolet Lithography

KW - Illumination System Design

KW - Large field of view

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U2 - 10.1109/IWAPS60466.2023.10366157

DO - 10.1109/IWAPS60466.2023.10366157

M3 - Conference contribution

AN - SCOPUS:85183018452

T3 - IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions

BT - IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions

A2 - Wei, Yayi

A2 - Ye, Tianchun

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 7th International Workshop on Advanced Patterning Solutions, IWAPS 2023

Y2 - 26 October 2023 through 27 October 2023

ER -

Zhang X, Chen Y, Nan Y, Li Y. Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System. In Wei Y, Ye T, editors, IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions. Institute of Electrical and Electronics Engineers Inc. 2023. (IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions). doi: 10.1109/IWAPS60466.2023.10366157

Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

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