Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

Xinyi Zhang, Yuqing Chen, Yanbei Nan, Yanqiu Li*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.

Original languageEnglish
Title of host publicationIWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions
EditorsYayi Wei, Tianchun Ye
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350344547
DOIs
Publication statusPublished - 2023
Event7th International Workshop on Advanced Patterning Solutions, IWAPS 2023 - Lishui, Zhejiang Province, China
Duration: 26 Oct 202327 Oct 2023

Publication series

NameIWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions

Conference

Conference7th International Workshop on Advanced Patterning Solutions, IWAPS 2023
Country/TerritoryChina
CityLishui, Zhejiang Province
Period26/10/2327/10/23

Keywords

  • Extreme Ultraviolet Lithography
  • Illumination System Design
  • Large field of view

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