Abstract
This paper reports a cell trapping and patterning method using dielectric-pattern-assisted negative dielectrophoresis (dnDEP) that can achieve high-density cell arrays and complicated cell patterns. The dnDEP device consists of two planar metal electrodes and a patterned dielectric layer sandwiched in-between. The dielectric patterns generate non-uniform electric fields when an ac voltage is applied on the two electrodes, and the interaction of polarizable cells and the non-uniform electric fields imposes negative DEP forces on the cells, pushing them to the patterns in the dielectric layer. Using this dnDEP device, human lymphoma cells were successfully patterned in high-density microwell arrays and stellate structures. Thanks to the three-dimensional configuration and the small distance between the electrodes, cell trapping and patterning can be implemented with a voltage of 10 V. This dnDEP device has the advantages of simple configuration, low actuating voltage, and the compatibility with high conductivity physiological media for cell culturing.
Original language | English |
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Pages (from-to) | 1001-1007 |
Number of pages | 7 |
Journal | Science China Technological Sciences |
Volume | 56 |
Issue number | 4 |
DOIs | |
Publication status | Published - Apr 2013 |
Keywords
- cell patterning
- dielectric
- dielectrophoresis (DEP)
- negative
- trapping