An improved tungsten titanium film photolithography process with single photoresist shaping mask

Gang Wang, Li Xin Xu, Chong Ying Lu, Qin Han, Lin Cong

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Tungsten titanium thin film with unique advantages has been widely applied in MEMS and CMOS fabrication. Micromechanical tungsten titanium structure layer demands an improved patterning process with high yield and precision to eliminate error and failure risk introduced by a commonly used additional upper aluminium mask. A tungsten titanium film photolithography process with single photoresist shaping mask and etching temperature control is presented. An experiment was made with photoresist coated samples to investigate the etching effect on photoresist and tungsten titanium relating to film thickness and temperature. Based on experiment analyses, the lithography parameters including photoresist processing and etching temperature were optimized to enhance the shielding ability of photoresist shaping mask during the entire tungsten titanium etching process. By following the improved lithography process, tungsten titanium test structures were fabricated to evaluate pattering quality. The fabricated structures demonstrated simplified fabrication flow and pattering precision, which obtained solutions of 2 μm in positive structures and 1 μm in negative structures.

Original languageEnglish
Title of host publicationAdvances in Energy Science and Equipment Engineering - Proceedings of International Conference on Energy Equipment Science and Engineering, ICEESE 2015
EditorsAragona Patty, Shiquan Zhou, Shiming Chen
PublisherCRC Press/Balkema
Pages2503-2508
Number of pages6
ISBN (Print)9781138029330
Publication statusPublished - 2015
EventInternational Conference on Energy Equipment Science and Engineering, ICEESE 2015 - Guangzhou, China
Duration: 30 May 201531 May 2015

Publication series

NameAdvances in Energy Science and Equipment Engineering - Proceedings of International Conference on Energy Equipment Science and Engineering, ICEESE 2015
Volume3

Conference

ConferenceInternational Conference on Energy Equipment Science and Engineering, ICEESE 2015
Country/TerritoryChina
CityGuangzhou
Period30/05/1531/05/15

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