组合倍率极紫外光刻物镜系统梯度膜设计方法

Translated title of the contribution: Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System

Mo Liu, Yanqiu Li

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The development of extreme ultraviolet(EUV) lithographic objective design is toward the direction of an anamorphic magnification objective system, and large field of view and high numerical aperture (NA) for projection objectives are both needed, which cause an extreme increase of incident angle and incident angle range of an objective lens system, so new methods for multilayer film design of anamorphic magnification EUV lithography objective systems are needed to explore. A progressive optimization multilayer film design method is presented to increase the reflectivity but not to change the imaging performance. This method is successfully applied to design the multilayer films of an anamorphic magnification EUV lithography objective system with NA=0.6. The results show that the average reflectivity of each mirror is higher than 65% and the reflectivity peak-to-valley value of each mirror is less than 3.35%, meanwhile, a good uniformity of reflectivity is maintained.

Translated title of the contributionGraded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System
Original languageChinese (Traditional)
Article number0522001
JournalGuangxue Xuebao/Acta Optica Sinica
Volume40
Issue number5
DOIs
Publication statusPublished - 10 Mar 2020

Fingerprint

Dive into the research topics of 'Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System'. Together they form a unique fingerprint.

Cite this