晶粒尺寸对CVD钨在800 ℃下氧化行为的影响

Translated title of the contribution: Effect of Grain Size on the Oxidation Behavior of CVD Tungsten at 800℃

Shihui Zhang, Kaijun Wang*, Jin Hu, Chengwen Tan, Xiaodong Yu, Yunbiao Duan, Weijun Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The pure tungsten metal prepared by chemical vapor deposition (CVD) have distinct grain size on different surfaces. The high temperature oxidation experiment was carried out in dry air and at 800℃. The effect of grain size on CVD tungsten was studied from the growth curve, phase composition and microstructure of the oxide film. The results show that the fine grain tungsten can form oxide film more quickly during the oxidation process, promote the formation of continuous and compact oxide film, and improve the oxidation resistance of tungsten. The effect of grain sizes on the oxidation behavior of tungsten is positive. As the tungsten in the fine grain part oxidizes to the interior, the grain size of the surface and the top surface are the same, and the oxidation rate of the bottom and top surface tend to be the same. In addition, the oxidation rate of the deposition layer increases obviously due to the influence of the edge effect.

Translated title of the contributionEffect of Grain Size on the Oxidation Behavior of CVD Tungsten at 800℃
Original languageChinese (Traditional)
Pages (from-to)4073-4078
Number of pages6
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume50
Issue number11
Publication statusPublished - Nov 2021

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