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Ultrathin Sn-doped Ga2O3 for power field-effect transistors: Si-compatible 4-inch array with high-k gate dielectric

  • Beijing Institute of Technology
  • CAS - Institute of Semiconductors
  • The University of Hong Kong

科研成果: 期刊稿件文章同行评审

源语言英语
页(从-至)1848-1851
页数4
期刊Science Bulletin
69
12
DOI
出版状态已出版 - 30 6月 2024

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