Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl4-ZrCl4-CH4-H2

Qiaomu Liu*, Litong Zhang, Yiguang Wang, Laifei Cheng

*此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

2 引用 (Scopus)

摘要

Thermodynamic equilibrium condensed phases for chemical vapor deposition of ZrC-SiC ternary system from SiCl4-ZrCl4-CH 4-H2 were calculated by Gibbs free energy minimization method. The effects of partial pressure of reactants, temperatures, total pressures, and carbon sources on the final condensed phases were demonstrated. It was found that the CH4 partial pressure is the controlling parameter of SiCl4-ZrCl4-CH4-H2 system. Reasonable reactant concentration ranges, temperatures and pressures for ZrC-SiC system were established according to these deposition phase diagrams. Compared with CH4, lower temperature is required to decompose C 3HD due to its lower chemical stability.

源语言英语
主期刊名Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8
出版商American Ceramic Society
65-75
页数11
ISBN(印刷版)9780470889367
DOI
出版状态已出版 - 2010
已对外发布
活动8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8 - Vancouver, BC, 加拿大
期限: 31 5月 20095 6月 2009

出版系列

姓名Ceramic Transactions
215
ISSN(印刷版)1042-1122

会议

会议8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8
国家/地区加拿大
Vancouver, BC
时期31/05/095/06/09

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