@inproceedings{64cb6110c2554f46adcb0161044d8ece,
title = "The distribution measurement of the photo-induced plasma in semiconductor by near-field scanning microwave microscopy",
abstract = "The photo-induced plasma in semiconductor is the fundamental property of the photoelectric phenomenon. The optical illumination of an intrinsic silicon wafer creates inhomogeneous electron-hole plasma in the illuminated area. In this work, an imaging method is proposed to measure the distribution of photo-induced plasma in silicon by a near-field scanning microwave microscopy. The method is implemented by imaging the distributions of photo-induced plasma on high resistance silicon wafer under laser illumination. It is therefore demonstrated to be an effective optoelectronic characteristic method for semiconductor at microwave frequency.",
author = "Liao Ma and Ning Leng and Ye, \{Xiu Zhu\} and Ming Jin and Ming Bai",
note = "Publisher Copyright: {\textcopyright} 2019 IEEE.; 2019 Photonics and Electromagnetics Research Symposium - Fall, PIERS - Fall 2019 ; Conference date: 17-12-2019 Through 20-12-2019",
year = "2019",
month = dec,
doi = "10.1109/PIERS-Fall48861.2019.9021849",
language = "English",
series = "2019 Photonics and Electromagnetics Research Symposium - Fall, PIERS - Fall 2019 - Proceedings",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "169--172",
booktitle = "2019 Photonics and Electromagnetics Research Symposium - Fall, PIERS - Fall 2019 - Proceedings",
address = "United States",
}