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Study of Film Discoloration and Moisture Influence in Plasam-Enhanced Sub-Atomsphericic Deposition for CSTIC 2026

  • Hui Li*
  • , Miao He
  • , Lei Wang
  • , Yeliang Wang
  • , Guangquan Lv
  • *此作品的通讯作者
  • Beijing Institute of Technology
  • Engineering Center

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

This study investigates the discoloration phenomenon in plasma-enhanced sub-atmospheric fill (PE-SAF) films, which manifests as visible defects accompanied by reduced film thickness (as measured by focused ion beam scanning electron microscopy, FIB-SEM), significant stoichiometric deviation (characterized via scanning electron microscopy with energy-dispersive X-ray spectroscopy, SEM-EDS), and elevated surface charge (detected by digital surface photovoltage, DSPV). A comprehensive approach combining multiphase simulation and controlled experimentations was employed to elucidate the underlying mechanism. The results indicate that increasing the equipment front-end module (EFEM) pressure differential relative to the external environment from 2.5 - 3 Pa to 7.5 - 8 Pa markedly reduces the incidence of film discoloration, with complete suppression achieved in small-batch tests. This optimization ultimately contributed to a 4% improvement in wafer yield during high-volume production, demonstrating significant practical implications for enhancing quality control in semiconductor manufacturing.

源语言英语
主期刊名2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026
编辑Cor Claeys, Bin Yu, Beichao Zhang, Peng Bai, Qianqian Huang, Xiaowei Li, Steve X. Liang, Hsiang-Lan Lung, Linyong Pang, Xinping Qu, Xiaoping Shi, Jianshi Tang, Pingqiang Zhou, Cheng Zhuo
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9798331592745
DOI
出版状态已出版 - 2026
活动2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026 - Shanghai, 中国
期限: 22 3月 202624 3月 2026

出版系列

姓名2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026

会议

会议2026 Conference of Science and Technology of Integrated Circuits, CSTIC 2026
国家/地区中国
Shanghai
时期22/03/2624/03/26

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