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Stable Silicene in Graphene/Silicene Van der Waals Heterostructures

  • Geng Li
  • , Lizhi Zhang
  • , Wenyan Xu
  • , Jinbo Pan
  • , Shiru Song
  • , Yi Zhang
  • , Haitao Zhou
  • , Yeliang Wang
  • , Lihong Bao
  • , Yu Yang Zhang
  • , Shixuan Du*
  • , Min Ouyang
  • , Sokrates T. Pantelides
  • , Hong Jun Gao
  • *此作品的通讯作者
  • University of Chinese Academy of Sciences
  • Department of Physics
  • University of Maryland, College Park
  • Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science
  • Vanderbilt University

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Silicene-based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.

源语言英语
期刊论文编号1804650
期刊Advanced Materials
卷30
期49
DOI
出版状态已出版 - 6 12月 2018
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