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Scalability Study on Ferroelectric-HfO2 Tunnel Junction Memory Based on Non-equilibrium Green Function Method

  • Fei Mo
  • , Yusaku Tagawa
  • , Takuya Saraya
  • , Toshiro Hiramoto
  • , Masaharu Kobayashi
  • The University of Tokyo

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

We have developed a numerical simulation framework for HfO2 based Ferroelectric Tunnel Junction (FTJ) memory using Non-Equilibrium Green Function (NEGF) and self-consistent potential method which is calibrated by our experimental FTJ results. Scalability and design guideline of Metal-Ferroelectric-Insulator-Semiconductor (MFIS) structure FTJ is investigated in this work. Due to the large asymmetry of dielectric screening length of MFIS structure FTJ electrodes, MFIS structure FTJ shows a higher tunneling electroresistance (TER) ratio than Metal-Ferroelectric-Insulator-Metal (MFIM) structure FTJ, while it has almost the same read current as MFIM structure FTJ. High read current and high TER ratio can be obtained by adjusting property of semiconductor bottom electrodes. A guideline of designing MFIS structure FTJ has been proposed for high read current and high TER ratio. MFIS type FTJ shows a potential for scaling down to sub-20 nm diameter.

源语言英语
主期刊名NVMTS 2019 - Non-Volatile Memory Technology Symposium 2019
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9781728144313
DOI
出版状态已出版 - 10月 2019
已对外发布
活动19th Non-Volatile Memory Technology Symposium, NVMTS 2019 - Durham, 美国
期限: 28 10月 201930 10月 2019

丛书

姓名NVMTS 2019 - Non-Volatile Memory Technology Symposium 2019

会议

会议19th Non-Volatile Memory Technology Symposium, NVMTS 2019
国家/地区美国
Durham
时期28/10/1930/10/19

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